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The form of the conductor, the crystallographic orientation of the grains within the metallic, procedures for the layer deposition, heat treatment or annealing, characteristics of the passivation, and the interface to other supplies additionally have an effect on the durability of the interconnects.
The traits are predominantly the composition of the metal alloy and the dimensions of the conductor. The effect is necessary in applications where excessive direct current densities are used, equivalent to in microelectronics and associated constructions. However, in excessive-power conditions (reminiscent of with the rising present draw and reducing wire sizes in modern VLSI microprocessors), if many electrons bombard the atoms with sufficient power to turn out to be significant, this will accelerate the means of electromigration by causing the atoms of the conductor to vibrate farther from their perfect lattice positions, rising the amount of electron scattering.